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Product Details:
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| Body Material: | 304L Or 316L Stainless Steel | Surface Finish: | Electropolished (Ra ≤0.4μm) |
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| Ultimate Pressure: | ≤1x10-8 Pa | Flange Type: | CF (ConFlat) Standard |
| Sealing Mechanism: | OFHC Copper Gasket | Bakeout Temperature: | Up To 250°C |
| Highlight: | UHV vacuum chamber,electropolished vacuum enclosure,low outgassing vacuum tank |
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This UHV-grade electropolished stainless steel vacuum chamber is purpose-built for ultra-high vacuum applications in semiconductor processing, surface science research, and advanced material characterization. Constructed from low-carbon 304L or 316L stainless steel, the chamber features a fully electropolished interior surface with a roughness average (Ra) of 0.4μm or better, dramatically reducing effective surface area and minimizing molecular outgassing. All flanges conform to the CF (ConFlat) standard with oxygen-free high-conductivity (OFHC) copper gasket sealing, enabling reliable operation at pressures down to 1x10-8 Pa and below. Every chamber is meticulously helium leak tested and vacuum baked prior to shipment, ensuring out-of-the-box UHV readiness for the most contamination-sensitive experimental and production environments.
Key Features| Parameter | Specification |
|---|---|
| Body Material | 304L or 316L Stainless Steel |
| Interior Surface Finish | Electropolished, Ra ≤0.4μm |
| Flange Standard | CF (ConFlat) with OFHC Copper Gaskets |
| Ultimate Pressure | ≤1x10-8 Pa |
| Leak Detection | Helium Mass Spectrometer, ≤1x10-11 Pa·m3/s |
| Maximum Bakeout Temperature | 250°C |
| Welding Method | Orbital TIG with Internal Purge |
| Production Type | OEM / ODM |
This UHV electropolished vacuum chamber forms the critical core of semiconductor wafer processing equipment, including molecular beam epitaxy (MBE) systems, ion implantation stations, and plasma-enhanced deposition reactors where even trace contamination can compromise device yield and performance. In surface science laboratories, the chamber enables X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and scanning tunneling microscopy (STM) experiments that require atomically clean surfaces maintained under UHV conditions. The chamber is equally suited for particle accelerator beamline components, synchrotron radiation end-stations, and space qualification testing facilities where residual gas analysis and contamination control are mission-critical. Additional deployments include UHV annealing furnaces for advanced materials development and thin-film growth chambers for quantum device fabrication.
Packaging & Quality AssuranceFollowing final helium leak certification and vacuum bakeout, each UHV chamber is backfilled with dry nitrogen, sealed with protective CF blank flanges and copper gaskets, and double-bagged in anti-static cleanroom-grade packaging before being placed in a nitrogen-purged wooden shipping crate. Documentation packages include individual helium leak test reports, material certificates with heat numbers, electropolishing surface roughness measurements, dimensional conformance records, and a pre-shipment bakeout log. SYNVAC provides comprehensive warranty coverage and dedicated applications engineering support for system integration, UHV operational procedures, and long-term performance maintenance.
Contact Person: Mr. Edison yang
Tel: 13218150898