Tees for Vacuum System: Versatile Branching with Uncompromised Integrity

Product Description

Tees for vacuum system are precision branch fittings designed to split or combine gas flow paths while preserving vacuum integrity from rough vacuum to ultra-high vacuum (UHV) levels. Unlike standard plumbing tees, these vacuum-rated components feature smooth internal geometries, minimal trapped volumes, and vacuum-grade surface finishes to eliminate virtual leaks and reduce outgassing.

Manufactured from low-carbon stainless steel (304L or 316L), these tees are essential for vacuum manifolds, instrumentation ports, gas introduction lines, and pumping networks. Each tee is fabricated with strict attention to weld quality, internal surface condition, and flange alignment across all three ports. Whether you are adding a pressure gauge, connecting a residual gas analyzer (RGA), or constructing a complex gas distribution system, these tees deliver the conductance and reliability that demanding high-vacuum and UHV applications require.

Key Features & Characteristics

• Configuration: True three-port tee (straight-through with perpendicular branch)

• Branch Orientation: Perpendicular (90°) to main axis (custom angles available)

• Vacuum Range: Atmospheric to 1×10⁻⁹ Torr (UHV compatible)

• Flange Standards: ISO-KF, ISO-K, CF (ConFlat), or custom configurations

• Material: 304L / 316L stainless steel (low magnetic permeability)

• Internal Surface Finish: Ra ≤ 0.8 µm (electropolished or mechanically polished)

• Outgassing Rate: < 2×10⁻⁸ Torr·L/s·cm² (after vacuum cleaning)

• Leak Integrity: Helium leak tested to < 1×10⁻⁹ mbar·L/s

• Bakeout Capability: Up to 400°C (CF flanges with metal seals)

• Port Options: All flanges rotatable, fixed, or mixed configurations

Applications

• Vacuum manifolds: Multi-port distribution networks for pumping and venting

• Instrumentation ports: Connecting pressure gauges, RGAs, and ion gauges

• Gas introduction lines: Admitting process gases into deposition chambers

• Thin-film deposition: Sputtering, evaporation, and ALD systems

• Helium leak detection: Creating T-branches for test port connections

• Analytical instruments: Mass spectrometers, electron microscopes, surface analysis tools

• Semiconductor equipment: Load locks, transfer chambers, and process modules

• R&D vacuum systems: Flexible experimental setups requiring multiple access points

Why Choose Our Tees for Vacuum Systems?

We combine precision forging, CNC machining, and orbital welding to deliver vacuum tees that meet or exceed international clean vacuum standards. Every tee is helium leak tested, ultrasonically cleaned with semiconductor-grade detergents, and double-bagged in a cleanroom environment. Reducing tees (different branch diameter), custom port orientations, and special lengths are available with engineering support.