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6061-T6 Aluminum Vacuum Chamber For Semiconductor High Strength

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6061-T6 Aluminum Vacuum Chamber For Semiconductor High Strength

6061-T6 Aluminum Vacuum Chamber For Semiconductor High Strength
6061-T6 Aluminum Vacuum Chamber For Semiconductor High Strength

Large Image :  6061-T6 Aluminum Vacuum Chamber For Semiconductor High Strength

Product Details:
Brand Name: SYNVAC
Payment & Shipping Terms:
Minimum Order Quantity: 1PCS
Packaging Details: Wooden boxes
Delivery Time: 8-10 weeks
Payment Terms: T/T, L/C

6061-T6 Aluminum Vacuum Chamber For Semiconductor High Strength

Description
Highlight:

6061 aluminum vacuum chamber

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Semiconductor aluminum vacuum chamber

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High Strength aluminium vacuum chamber

6061-T6 Aluminum Vacuum Chamber For Semiconductor High Strength 0

 

Aluminum Vacuum Chamber: Lightweight, High-Conductivity & Outgassing-Optimized

Product Description

The Aluminum Vacuum Chamber is a precision-engineered enclosure designed for low to medium vacuum applications where weight reduction and thermal management are critical. Constructed from aerospace-grade 6061-T6 aluminum, this chamber delivers exceptional performance in research laboratories, thin-film deposition systems, leak detection, and environmental testing.

Unlike stainless steel alternatives, an aluminum vacuum chamber offers faster pump-down cycles due to its lower outgassing rate after proper surface treatment. Each unit is manufactured using strict welding protocols and finished with a hard anodized or anti-corrosion coating to ensure vacuum integrity down to 10⁻⁶ Torr (high vacuum range). Whether you need a small cube chamber for R&D or a large cylindrical vessel for industrial coating, this solution combines structural reliability with operational efficiency.

Key Features & Characteristics

 

 

  • Material: 6061-T6 Aluminum Alloy (high strength, excellent machinability)

  • Vacuum Range: Atmospheric to 1×10⁻⁶ Torr (High Vacuum ready)

  • Outgassing Rate: < 2×10⁻⁸ Torr·L/s·cm² (after cleaning and baking)

  • Port Configuration: Customizable CF (ConFlat), KF (Quick Flange), or ISO fittings

  • Surface Finish: Hard anodized (50 µm) or electropolished inner surface

  • Leak Integrity: Helium leak tested to < 1×10⁻⁹ mbar·L/s

  • Operating Temperature: -20°C to 150°C (dependent on seals used)

  • Weight: Up to 50% lighter than comparable stainless steel chambers

  • Internal Volume: Custom from 0.5 liters to 200+ liters

Applications

Thin film deposition: Sputtering, e-beam evaporation, thermal evaporation

Analytical instruments: SEM/FIB sample prep chambers, mass spectrometry

Leak detection: Helium leak testing stations

R&D laboratories: Vacuum furnace testing, material outgassing studies

 

 

Why Our Aluminum Vacuum Chamber Performs Better

We combine precision CNC machining with TIG welding by certified vacuum welders. Every chamber undergoes a three-step quality process: ultrasonic cleaning, helium leak detection, and surface roughness verification (Ra ≤ 0.8 µm internal). For ultra-high vacuum (UHV) requirements, we offer vacuum baking and metal-seal flange preparation.

 

Call to Action: Request a customized Aluminum Vacuum Chamber quote today. Upload your port layout drawing or target vacuum level for a same-day engineering feasibility analysis.

 

Contact Details
Kunshan SYNVAC Vacuum Equipment Co.,LTD

Contact Person: Mr. Edison yang

Tel: 13218150898

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